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Tantalum Powder | Ta Metal Powder

HTTa0002

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Tantalum powder exhibits outstanding properties, including a high melting point, low vapor pressure, excellent cold processing capabilities, high chemical stability, robust resistance to liquid metal corrosion, and a substantial dielectric constant of the surface oxide film. It is categorized into capacitor-grade tantalum powder, metallurgical tantalum powder, and medical tantalum powder.

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Data sheet

Particle Size-325 mesh, -200 mesh, or customized
Molecular FormulaTa
Purity99.9%, 99.99%, 99.999%
CAS7440-25-7

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Tantalum powder exhibits outstanding properties, including a high melting point, low vapor pressure, excellent cold processing capabilities, high chemical stability, robust resistance to liquid metal corrosion, and a substantial surface oxide film dielectric constant. 

HM is a professional supplier and manufacturer of tantalum powder, offering a range of options tailored to specific requirements including purity, shape, powder morphology, and oxygen content. Our top-quality tantalum powder features high purity (99.95%), low oxygen content (500ppm), and fine particle sizes (1-3um), all available at competitive prices.

Tantalum Powder (Ta Powder)

Tantalum Powder Inventory

Tantalum Powder Specifications

Item No.

Description

Purity

Lot Size

ME73-3N5(SR)

Tantalum Metal Powder 
Metallurgical Grade 
-150 mesh or -325 mesh.

Ta > 99.95% (metals basis) 
Nb < 0.010%, Fe < 0.005%, Ni < 0.005%, Si < 0.015% 
O < 0.2%, H < 0.005%, N < 0.01%, C < 0.015%

10 kg 
50 kg 
100 kg

ME73-3N5(EB)

Tantalum Metal Powder 
Electron Beam Grade 
-150 mesh or -325 mesh.

Ta > 99.95% (metals basis) 
Nb < 50 ppm, Fe < 25 ppm, Ni < 50 ppm, Si < 10 ppm 
O < 2000 ppm, N < 50 ppm, C < 50 ppm

10 kg 
50 kg 
100 kg

ME73-3N5(CP)

Tantalum Metal Powder 
Various Capacitor Grades 
Ask for detailed specs.

Ta > 99.95% (metals basis) 
O 1600~2800 ppm, N 70~300 ppm, C 70~100 ppm 
Nb < 50 ppm, Fe+Cr+Ni < 150 ppm, Si < 10 ppm 
Specific capacitance: 3,500 to 40,000 µfv/g

10 kg 
50 kg 
100 kg

*Heeger Materials offers broad selections of bulk density, particle size range, and purity. The purity includes commercially pure, 3N (99.9%), 3N5 (99.95%), 4N (99.99%), and 4N5 (99.995%).

*Special particle sizes can be customized upon your request

Tantalum Powder Applications

Tantalum metal powder can be used in sputtering targets, alloys, thermal and chemical resistant coating, 3D printing (additive manufacturing), and electrolytic capacitors. There are four types of powders:

  • Nodular powder from the chemical reduction of tantalum salt or oxide. The resulting powder is aggregated consisting of primary particles and pores. It has a relatively low density and high surface area.
  • EB powder from hydride and de-hydride of electron bean or arc melted ingot. The particle of this powder is typically angular and non-aggregated.
  • Capacitor-grade powder can be used to manufacture high-performance chip or dipping-type tantalum electrolyte capacitors.
  • Spherical powder from plasma inert gas atomization. This generates a spherical shape with a smooth surface that has excellent flow characteristics. The powder is particularly suitable for 3D printing (Spherical Tantalum Powder). 

Tantalum Powder Packing

The Tantalum (Ta) Powder should be stored in a sealed container in a dry and cool place and not exposed to air for an extended period. HM offers vacuum-sealed packaging including 100g/bag, 500g/bag, 1kg/bag, and 25kg/drum, or can offer customized packaging as per specific requirements.

Tantalum (Ta) Powder Packing

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