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Aluminum Nitride Film Template On Silicon | 4"/6"
New product
Aluminum Nitride (AlN) Film Template on Silicon offers excellent thermal conductivity and is ideal for UVC-LEDs, UV detectors, and semiconductors. Available in 4" and 6" sizes, it provides a stable platform for high-quality Aluminum Nitride films. Heeger Materials (HM) ensures consistent quality for optimal performance.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Data sheet
| Diameter | 4 inch, 6 inch, 8 inch |
| Thick | 200/400/500/600/800 or customized |
| Density | 3.23 g/cc |
| Melting Piont | 2750 ℃ (under 10-100 bar of Nitrogen) |
More info
Aluminum Nitride (AlN) Film Template on Silicon provides a high-quality substrate with exceptional thermal conductivity and mechanical strength, making it perfect for advanced applications in optoelectronics and power electronics. Available in 4" and 6" sizes, this template serves as a reliable platform for growing Aluminum Nitride films, offering excellent performance for devices like UVC-LEDs, UV detectors, and semiconductor components. Its superior heat dissipation and material properties ensure enhanced efficiency and longevity in high-performance applications. Heeger Materials (HM) guarantees consistent quality, delivering reliable solutions for your specialized needs. Furthermore, we offer Aluminum Nitride (AlN) Ceramic Substrate to fulfill particular requirements.
AlN Film Template On Silicon Specifications
| Specification Parameters | Parameter Values | ||
Substrate | Silicon single crystal wafer (100) plane | ||
Doping Type | N/P | ||
Resistivity (Ω) | >5000 | ||
AIN Epitaxial Layer Crystal Structure | Wurtzite | ||
Diameter (inch) | 4 | 6 | 8 |
Substrate Thickness (μm) | 525 ± 20 | 625 ± 15 | 725 ± 15 |
AIN Epitaxial Layer Thickness (nm) | 200/400/500/600/800 or customized, the parameters in this table are based on 500nm | ||
Crystal Orientation | C-axis [0001] ±/- 0.2° | ||
Effective Area | ≥95% | ||
Cracks | None | ||
XRD Powder FWHM @(0002) | ≤0.2° | ||
HRXRD FWHM @(0002) | ≤1.55° | ||
Surface Roughness [5×5μm] (nm) | ≤2.0 | ||
Total Thickness Variation (μm) | ≤10 | ≤5 | ≤4 |
Warpage (μm) | ≤25 | ≤40 | ≤40 |
Bending (μm) | ≤25 | ≤40 | ≤40 |
Packaging | Single wafer cassette/Multiple wafer cassette | ||
Note | The above parameter values may vary slightly depending on the actual testing equipment or software used | ||
AlN Film Template on Silicon Partial Characterization Results
Example With An AlN Film Thickness of 200nm:
1. Powder XRD and Full Width at Half Maximum (FWHM):
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2. HDXRD and Full Width at Half Maximum (FWHM):
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3. Silicon-Based Aluminum Nitride Template AFM Morphology:
Aluminum Nitride Crystal Structure
Aluminum Nitride Material Physical Property Parameters
Common Parameters | Parameter Values |
Crystal Structure | Wurtzite - type |
Lattice Constant (Å) | a=3.112, c=4.982 |
Conduction Band Type | Direct Bandgap |
Crystal Density (g/cm³) | 3.23 |
Knoop Hardness of the Surface | 800 |
Melting Point (°C) | 2750 (under 10 - 100 bar of nitrogen) |
Thermal Conductivity (W/m·K) | 320 |
Bandgap (eV) | 6.28 |
Electron Mobility (V·s/cm²) | 1100 |
Breakdown Field Strength (MV/cm) | 11.7 |
Sound Velocity (m/s) | 11300 |
AlN Film Template on Silicon Applications
- UVC-LED and Ultraviolet Detectors: Aluminum Nitride (AlN) Film Templates on Silicon are ideal for UVC-LEDs and ultraviolet detectors, offering high thermal conductivity and superior mechanical properties to ensure efficient light emission and high sensitivity in detection.
- 5G Wireless Communication Devices: With its exceptional heat dissipation and stability, this template is perfect for high-performance 5G communication components such as SAW (Surface Acoustic Wave) and BAW (Bulk Acoustic Wave) devices, supporting reliable signal transmission and performance.
- Power Electronics and RF Devices: The AlN film template is widely used in power electronics and radio-frequency (RF) devices, where its high thermal conductivity is critical for managing heat in high-power and high-frequency applications, ensuring the longevity and efficiency of the devices.
- UV Purification and Sterilization: AlN templates are also used in UV-C purification and sterilization systems, playing a crucial role in applications such as water treatment, air sterilization, surface disinfection, and odor removal, contributing to environmental and public health.
- Advanced Medical and Biotech Applications: These templates are applied in medical light therapy, drug research, secure communication technologies, and ultraviolet-based space exploration, providing reliable substrates for cutting-edge research and development in health, security, and scientific exploration.
Where to Buy Aluminum Nitride Film Template on Silicon in Bulk?
Heeger Materials Inc., a professional supplier and manufacturer of high-quality Aluminum Nitride (AlN) products, including Aluminum Nitride Film Template on Silicon, leverages extensive expertise in supply and export to offer competitive prices. We provide customized solutions to meet specific requirements, ensuring exceptional quality and customer satisfaction.
Heeger Materials Inc. was established in 2016 in Colorado, USA. We specialize in premium-grade metals, alloys, ceramics, powders, and other materials catering to research, development, and large-scale industrial production in scientific and industrial sectors.
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